Invention Grant
- Patent Title: Pixel structure and manufacturing method thereof
- Patent Title (中): 像素结构及其制造方法
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Application No.: US13437003Application Date: 2012-04-02
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Publication No.: US08823000B2Publication Date: 2014-09-02
- Inventor: Kuo-Wei Wu , Chin-Tzu Kao
- Applicant: Kuo-Wei Wu , Chin-Tzu Kao
- Applicant Address: TW Bade, Taoyuan
- Assignee: Chunghwa Picture Tubes, Ltd.
- Current Assignee: Chunghwa Picture Tubes, Ltd.
- Current Assignee Address: TW Bade, Taoyuan
- Agent Winston Hsu; Scott Margo
- Priority: TW101101065A 20120111
- Main IPC: H01L29/786
- IPC: H01L29/786

Abstract:
A pixel structure includes a substrate, a gate line, a data line, a semiconductor pattern, a non-metal source electrode pattern, a non-metal drain electrode pattern, and a pixel electrode. The gate line and the data line are disposed on the substrate. The semiconductor pattern is disposed on the gate line, and the semiconductor pattern overlaps two corresponding edges of the gate line along a vertical projective direction. The non-metal source electrode pattern and the non-metal drain electrode pattern are disposed on the semiconductor pattern. The non-metal source electrode pattern and the non-metal drain electrode pattern are respectively disposed on two corresponding edges of the gate line. The non-metal source electrode pattern is partially disposed between the data line and the gate line. The pixel electrode is electrically connected to the non-metal drain electrode pattern.
Public/Granted literature
- US20130175531A1 PIXEL STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2013-07-11
Information query
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