Invention Grant
- Patent Title: Nitride semiconductor light-emitting element and manufacturing method therefor
- Patent Title (中): 氮化物半导体发光元件及其制造方法
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Application No.: US13880027Application Date: 2012-05-02
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Publication No.: US08823026B2Publication Date: 2014-09-02
- Inventor: Toshiya Yokogawa , Junko Iwanaga , Akira Inoue
- Applicant: Toshiya Yokogawa , Junko Iwanaga , Akira Inoue
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- Priority: JP2011-111110 20110518
- International Application: PCT/JP2012/002969 WO 20120502
- International Announcement: WO2012/157198 WO 20121122
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/32 ; H01L33/02 ; H01L33/16

Abstract:
A nitride-based semiconductor light-emitting device of an embodiment includes a semiconductor multilayer structure having a growing plane which is an m-plane and being made of a GaN-based semiconductor. The semiconductor multilayer structure includes a n-type semiconductor layer, a p-type semiconductor layer, a p-side electrode provided on the p-type semiconductor layer, and an active layer interposed between the n-type semiconductor layer and the p-type semiconductor layer. The ratio of the thickness of the active layer to the thickness of the n-type semiconductor layer, D, is in the range of 1.8×10−4≦D≦14.1×10−4. The area of the p-side electrode, S, is in the range of 1×102 μm2≦S≦9×104 μm2. A maximum current density which leads to 88% of a maximum of the external quantum efficiency is not less than 2 A/mm2.
Public/Granted literature
- US20130214288A1 NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND MANUFACTURING METHOD THEREFOR Public/Granted day:2013-08-22
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