Invention Grant
- Patent Title: Semiconductor devices and methods of making
- Patent Title (中): 半导体器件及制造方法
-
Application No.: US11855459Application Date: 2007-09-14
-
Publication No.: US08823100B2Publication Date: 2014-09-02
- Inventor: Gregory Herman , Peter Mardllovich , Randy Hoffman
- Applicant: Gregory Herman , Peter Mardllovich , Randy Hoffman
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: H01L29/72
- IPC: H01L29/72 ; H01L29/786 ; H01L29/66 ; H01L29/417 ; H01L29/739

Abstract:
In one method of forming a semiconductor device, a first electrode is formed electrically coupled with a semiconductor material. After the first electrode is formed, an insulator is formed over the semiconductor material adjoining the first electrode and extending a selected distance from the first electrode. After the insulator is formed, a second electrode is formed electrically coupled with the semiconductor material adjoining the insulator.
Public/Granted literature
- US20080042201A1 Semiconductor Devices and Methods of Making Public/Granted day:2008-02-21
Information query
IPC分类: