Invention Grant
- Patent Title: Semiconductor structure for a radiation detector and a radiation detector
- Patent Title (中): 辐射探测器和辐射探测器的半导体结构
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Application No.: US13765710Application Date: 2013-02-13
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Publication No.: US08823124B2Publication Date: 2014-09-02
- Inventor: Michael Pierschel
- Applicant: First Sensor AG
- Applicant Address: DE
- Assignee: First Sensor AG
- Current Assignee: First Sensor AG
- Current Assignee Address: DE
- Agency: Schmeiser, Olsen & Watts LLP
- Priority: DE102012101224 20120215; DE102012103699 20120426
- Main IPC: H01L31/0352
- IPC: H01L31/0352 ; H01L27/144 ; H01L31/107

Abstract:
A semiconductor structure for a radiation detector, comprising a substrate composed of a semiconductor material of a first conductivity type, a semiconductor substrate, wherein the semiconductor substrate is provided with a semiconductor layer provided on the substrate and having a higher resistance in comparison to the substrate, of the first conductivity type, and electrically doped with a doping concentration, a plurality of doped regions, wherein the plurality of doped regions are provided in the semiconductor substrate and separated from each other, of a second conductivity type that is opposite from the first conductivity type, and electrically doped with a doping concentration that is higher than the doping concentration in the semiconductor substrate, at least one further doping region, and a cover layer is provided.
Public/Granted literature
- US20130207216A1 SEMICONDUCTOR STRUCTURE FOR A RADIATION DETECTOR AND A RADIATION DETECTOR Public/Granted day:2013-08-15
Information query
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