Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US13275430Application Date: 2011-10-18
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Publication No.: US08823155B2Publication Date: 2014-09-02
- Inventor: Toshio Nakasaki
- Applicant: Toshio Nakasaki
- Applicant Address: JP Kyoto
- Assignee: Rohm Co., Ltd.
- Current Assignee: Rohm Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: JP2010-234689 20101019
- Main IPC: H01L27/00
- IPC: H01L27/00 ; H01L21/76 ; H01L21/683 ; H01L21/764 ; H01L21/786 ; H01L21/762 ; H01L23/48 ; H01L21/768 ; H01L25/18 ; H01L21/304 ; H01L23/00

Abstract:
A semiconductor device includes a first semiconductor chip including a first surface, a second surface and a first terminal arranged on the first surface, a second semiconductor chip including a first surface, a second surface and a second terminal arranged on the first surface of the second semiconductor chip, a support substrate including a first surface bonded to the second surfaces of the first semiconductor chip and the second semiconductor chip, and an isolation groove formed on the first surface of the support substrate. The isolation includes a pair of side surfaces continuously extending from opposing side surfaces of the first semiconductor chip and the second semiconductor chip, respectively, and the isolation groove is formed into the support substrate to extend from the first surface of the support substrate. The isolation groove has a depth less than a thickness of the support substrate.
Public/Granted literature
- US20120091555A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2012-04-19
Information query
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