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US08823170B2 Apparatus and method for three dimensional integrated circuits 有权
三维集成电路的装置和方法

Apparatus and method for three dimensional integrated circuits
Abstract:
A structure comprises a substrate comprising a plurality of traces on top of the substrate, a plurality of connectors formed on a top surface of a semiconductor die, wherein the semiconductor die is formed on the substrate and coupled to the substrate through the plurality of connectors and a dummy metal structure formed at a corner of a top surface of the substrate, wherein the dummy metal structure has two discontinuous sections.
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