Invention Grant
US08823186B2 Fiber-containing resin substrate, sealed substrate having semiconductor device mounted thereon, sealed wafer having semiconductor device formed thereon, a semiconductor apparatus, and method for manufacturing semiconductor apparatus
有权
含有纤维的树脂基板,其上安装有半导体装置的密封基板,其上形成有半导体装置的密封晶片,半导体装置和半导体装置的制造方法
- Patent Title: Fiber-containing resin substrate, sealed substrate having semiconductor device mounted thereon, sealed wafer having semiconductor device formed thereon, a semiconductor apparatus, and method for manufacturing semiconductor apparatus
- Patent Title (中): 含有纤维的树脂基板,其上安装有半导体装置的密封基板,其上形成有半导体装置的密封晶片,半导体装置和半导体装置的制造方法
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Application No.: US13301035Application Date: 2011-11-21
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Publication No.: US08823186B2Publication Date: 2014-09-02
- Inventor: Susumu Sekiguchi , Toshio Shiobara
- Applicant: Susumu Sekiguchi , Toshio Shiobara
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2010-289900 20101227
- Main IPC: H01L23/29
- IPC: H01L23/29

Abstract:
A fiber-containing resin substrate for collectively sealing a semiconductor devices mounting surface of a substrate having the semiconductor devices mounted thereon or a semiconductor devices forming surface of a wafer having semiconductor devices formed thereon, includes: a resin-impregnated fiber base material obtained by impregnating a fiber base material with a thermosetting resin and semi-curing or curing the thermosetting resin; and an uncured resin layer containing an uncured thermosetting resin and formed on one side of the resin-impregnated fiber base material. There can be a fiber-containing resin substrate that enables suppressing warp of a wafer and delamination of semiconductor devices even though a large-diameter wafer or a large-diameter substrate made of a metal and the like is sealed, enables collectively sealing a semiconductor devices mounting surface of the substrate or a semiconductor devices forming surface of the wafer, and has excellent heat resistance or moisture resistance after sealing.
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