Invention Grant
- Patent Title: Overlay measurement apparatus, lithographic apparatus and device manufacturing method using such overlay measurement apparatus
- Patent Title (中): 覆盖测量装置,光刻设备和使用这种覆盖测量装置的装置制造方法
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Application No.: US13000229Application Date: 2009-05-14
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Publication No.: US08823922B2Publication Date: 2014-09-02
- Inventor: Arie Jeffrey Den Boef
- Applicant: Arie Jeffrey Den Boef
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox, P.L.L.C.
- International Application: PCT/EP2009/055809 WO 20090514
- International Announcement: WO2009/156225 WO 20091230
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/42 ; G03B27/32

Abstract:
An overlay measurement apparatus has a polarized light source for illuminating a sample with a polarized light beam and an optical system to capture light that is scattered by the sample. The optical system includes a polarizer for transmitting an orthogonal polarization component that is orthogonal to a polarization direction of the polarized light beam. A detector measures intensity of the orthogonal polarization component. A processing unit is connected to the detector, and is arranged to process the orthogonal polarization component for overlay metrology measurement using asymmetry data derived from the orthogonal polarization component.
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