Invention Grant
- Patent Title: Measurement apparatus
- Patent Title (中): 测量装置
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Application No.: US13271356Application Date: 2011-10-12
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Publication No.: US08823949B2Publication Date: 2014-09-02
- Inventor: Chih-Kuang Chang , Wen-Dong Liu
- Applicant: Chih-Kuang Chang , Wen-Dong Liu
- Applicant Address: CN Shenzhen TW New Taipei
- Assignee: Hong Fu Jin Precision Industry (ShenZhen) Co., Ltd.,Hon Hai Precision Industry Co., Ltd.
- Current Assignee: Hong Fu Jin Precision Industry (ShenZhen) Co., Ltd.,Hon Hai Precision Industry Co., Ltd.
- Current Assignee Address: CN Shenzhen TW New Taipei
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: CN201110031067 20110128
- Main IPC: G01B11/24
- IPC: G01B11/24

Abstract:
A measurement apparatus includes a pedestal, a supporting tray, a first movable base, a first measuring assembly, a second movable base, a second measuring assembly, a third movable base, a third measuring assembly, and a console. The supporting tray is rotationally fixed in the pedestal and can be rotated to position a workpiece at different angles to ensure that images of all portions and surfaces needing to be measured can be captured.
Public/Granted literature
- US20120192661A1 MEASUREMENT APPARATUS Public/Granted day:2012-08-02
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