Invention Grant
- Patent Title: Hot electron injection nanocrystals MOS transistor
- Patent Title (中): 热电子注入纳米晶体MOS晶体管
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Application No.: US13439140Application Date: 2012-04-04
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Publication No.: US08824210B2Publication Date: 2014-09-02
- Inventor: Francesco La Rosa
- Applicant: Francesco La Rosa
- Applicant Address: FR Rousset
- Assignee: STMicroelectronics (Rousset) SAS
- Current Assignee: STMicroelectronics (Rousset) SAS
- Current Assignee Address: FR Rousset
- Agency: Seed IP Law Group PLLC
- Priority: FR1152885 20110404; FR1152886 20110404
- Main IPC: G11C16/10
- IPC: G11C16/10

Abstract:
The disclosure relates to a hot electron injection MOS transistor, comprising source and drain regions formed in a semiconductor substrate, a control gate, and a floating gate comprising electrically conductive nanoparticles. The control gate comprises a first portion arranged at a first distance from the substrate, a second portion arranged at a second distance less than the first distance from the substrate, and an intermediary portion linking the first and the second portions.
Public/Granted literature
- US20120250417A1 HOT ELECTRON INJECTION NANOCRYSTALS MOS TRANSISTOR Public/Granted day:2012-10-04
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