Invention Grant
- Patent Title: System and method for quality control in a high volume talent acquisition
- Patent Title (中): 大量人才招聘的质量控制体系和方法
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Application No.: US12901584Application Date: 2010-10-11
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Publication No.: US08825558B2Publication Date: 2014-09-02
- Inventor: Ajay Anantkumar Parikh , Padmini Mani Giri , Moumita C Bhattacharya , Sonali Garg , Swati Bhalla
- Applicant: Ajay Anantkumar Parikh , Padmini Mani Giri , Moumita C Bhattacharya , Sonali Garg , Swati Bhalla
- Applicant Address: IN Bangalore
- Assignee: Wipro Limited
- Current Assignee: Wipro Limited
- Current Assignee Address: IN Bangalore
- Agency: LeClairRyan, a Professional Corporation
- Main IPC: G06Q10/00
- IPC: G06Q10/00 ; G06Q10/10

Abstract:
A system and method for quality control in a high volume talent acquisition is disclosed. In one embodiment, a system for quality control in a high volume talent acquisition includes a processor, a quality talent acquisition database for storing a plurality of candidate e-dossiers and historical data associated with fraudulent practices used in the talent acquisition, memory operatively coupled to the processor and the quality talent acquisition database, and a quality talent acquisition module communicatively coupled to the processor and the quality talent acquisition database. The quality talent acquisition module includes a selection module for selecting one or more prospective candidates from the plurality of candidate e-dossiers, a fraud and non-compliance module for obtaining information associated with fraudulent practices, an e-dossier compilation module for compiling the candidate e-dossiers and a sampling module for sampling on a real-time basis the selected one or more candidates.
Public/Granted literature
- US20120089528A1 SYSTEM AND METHOD FOR QUALITY CONTROL IN A HIGH VOLUME TALENT ACQUISITION Public/Granted day:2012-04-12
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