Invention Grant
- Patent Title: Automated inline defect characterization
- Patent Title (中): 自动内联缺陷表征
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Application No.: US13539249Application Date: 2012-06-29
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Publication No.: US08826209B2Publication Date: 2014-09-02
- Inventor: James Robert Kramer , Ankush Oberai
- Applicant: James Robert Kramer , Ankush Oberai
- Applicant Address: US CA Mountain View
- Assignee: Synopsys, Inc.
- Current Assignee: Synopsys, Inc.
- Current Assignee Address: US CA Mountain View
- Agency: Adams Intellex, PLC
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
Defect characterization is a useful tool for analyzing and improving fabrication for semiconductor chips. By using layout and netlist in combination with images of semiconductors, defects can be identified and analyzed. Electrical simulation can be performed on the netlist, based on the presence of the defect that was detected. Layout geometries where the defect was detected can be binned and a search can be performed of the remainder of the layout for similar groupings of layout geometries. Various representations of the semiconductor can be cross mapped, including layout, schematic, and netlist. The presence of certain defects can be correlated to yield, performance, and other characteristics.
Public/Granted literature
- US20130007684A1 AUTOMATED INLINE DEFECT CHARACTERIZATION Public/Granted day:2013-01-03
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