Invention Grant
- Patent Title: Method for manufacturing substrate with metal film
- Patent Title (中): 金属膜制造衬底的方法
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Application No.: US12732635Application Date: 2010-03-26
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Publication No.: US08826530B2Publication Date: 2014-09-09
- Inventor: Ayao Niki , Atsushi Ishida , Ryojiro Tominaga
- Applicant: Ayao Niki , Atsushi Ishida , Ryojiro Tominaga
- Applicant Address: JP Ogaki-shi
- Assignee: IBIDEN Co., Ltd.
- Current Assignee: IBIDEN Co., Ltd.
- Current Assignee Address: JP Ogaki-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01K3/10
- IPC: H01K3/10 ; H05K3/46 ; H05K3/00 ; C25D7/12 ; H05K3/42 ; C25D5/02 ; H05K3/38

Abstract:
A method for manufacturing a substrate with a metal film includes preparing an insulative substrate having the first surface and the second surface on the opposite side of the first surface, forming in the insulative substrate a penetrating hole having the inner wall tapering from the first surface of the insulative substrate toward the second surface, forming a layer of a composition containing a polymerization initiator and a polymerizable compound on the inner wall of the penetrating hole, irradiating the layer of the composition with energy such that a polymer is formed on the inner wall of the penetrating hole, applying a plating catalyst on the polymer, and forming a plated-metal film on the inner wall of the penetrating hole.
Public/Granted literature
- US20100243305A1 SUBSTRATE WITH METAL FILM AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2010-09-30
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