Invention Grant
- Patent Title: Apparatus and method for heat treating a glass substrate
- Patent Title (中): 玻璃基板热处理装置及方法
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Application No.: US12871204Application Date: 2010-08-30
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Publication No.: US08826693B2Publication Date: 2014-09-09
- Inventor: Frank T. Coppola , Monica J. Mashewske
- Applicant: Frank T. Coppola , Monica J. Mashewske
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Kevin M. Able
- Main IPC: C03B23/02
- IPC: C03B23/02 ; C03B29/02 ; C03B25/02 ; C03B35/20 ; C03B23/00

Abstract:
An apparatus and method for heat treating a plurality of glass substrates. The glass substrates are supported on support platform and housed in a heat treating furnace. The substrates are supported in a substantially vertical orientation by restraining pins extending through walls of the furnace, and are separated from each other by frame-shaped spacing members. The spacing members reduce convection currents between the substrates and reduce or eliminate the post-heat treating distortion of each glass substrate to less than 100 μm over the entire surface of the substrate.
Public/Granted literature
- US20120047954A1 APPARATUS AND METHOD FOR HEAT TREATING A GLASS SUBSTRATE Public/Granted day:2012-03-01
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