Invention Grant
- Patent Title: Liquid application apparatus, liquid application method and imprinting system
- Patent Title (中): 液体施用装置,液体施加方法和压印系统
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Application No.: US13635250Application Date: 2011-03-15
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Publication No.: US08827400B2Publication Date: 2014-09-09
- Inventor: Kenichi Kodama
- Applicant: Kenichi Kodama
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2010-060919 20100317
- International Application: PCT/JP2011/056683 WO 20110315
- International Announcement: WO2011/115282 WO 20110922
- Main IPC: B41J29/38
- IPC: B41J29/38 ; B82Y10/00 ; B82Y40/00 ; G03F7/00 ; B41M7/00

Abstract:
A liquid application apparatus includes: a head including a plurality of nozzles which eject droplets of liquid having functional properties toward a substrate; a relative movement device which causes the head and the substrate to move relatively to each other in a relative movement direction; a droplet ejection control device which operates the head at a prescribed droplet ejection period so as to deposit the droplets discretely onto the substrate; an x-direction droplet deposition pitch changing device which changes a deposition pitch of the droplets on the substrate in an x direction perpendicular to the relative movement direction; and a y-direction droplet deposition pitch changing device which changes a deposition pitch of the droplets on the substrate in a y direction parallel to the relative movement direction.
Public/Granted literature
- US20130010020A1 LIQUID APPLICATION APPARATUS, LIQUID APPLICATION METHOD AND IMPRINTING SYSTEM Public/Granted day:2013-01-10
Information query
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