An implant and a method of producing the implant are provided. The implant can have at least one outer surface extending in its longitudinal direction. The implant can comprise an underlying wave pattern, an intermediate wave pattern, and a microscopic roughening layer. The underlying wave pattern can have waves that extend substantially in the longitudinal direction. Further, the intermediate wave pattern can be formed on the waves of the underlying wave pattern. Additionally, the microscopic roughening layer can be formed on top of the underlying wave pattern.