Invention Grant
- Patent Title: Method of particle contaminant removal
- Patent Title (中): 颗粒污染物去除方法
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Application No.: US12401590Application Date: 2009-03-10
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Publication No.: US08828145B2Publication Date: 2014-09-09
- Inventor: Yizhak Sabba , Seokmin Yun , Mark Kawaguchi , Mark Wilcoxson , Dragan Podlesnik
- Applicant: Yizhak Sabba , Seokmin Yun , Mark Kawaguchi , Mark Wilcoxson , Dragan Podlesnik
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla Group, LLP
- Main IPC: B08B7/00
- IPC: B08B7/00 ; B08B6/00 ; B08B5/04 ; H01L21/67 ; H01L21/02

Abstract:
Apparatus and methods for removing particle contaminants from a surface of a substrate includes coating a layer of a viscoelastic material on the surface. The viscoelastic material is coated as a thin film and exhibits substantial liquid-like characteristic. An external force is applied to a first area of the surface coated with the viscoelastic material such that a second area of the surface coated with the viscoelastic material is not substantially subjected to the applied force. The force is applied for a time duration that is shorter than a intrinsic time of the viscoelastic material so as to access solid-like characteristic of the viscoelastic material. The viscoelastic material exhibiting solid-like characteristic interacts at least partially with at least some of the particle contaminants present on the surface. The viscoelastic material along with at least some of the particle contaminants is removed from the first area of the surface while the viscoelastic material is exhibiting solid-like characteristics.
Public/Granted literature
- US20100229890A1 Method of Particle Contaminant Removal Public/Granted day:2010-09-16
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