Invention Grant
- Patent Title: Method for manufacturing trichlorosilane
- Patent Title (中): 制备三氯硅烷的方法
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Application No.: US13533035Application Date: 2012-06-26
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Publication No.: US08828345B2Publication Date: 2014-09-09
- Inventor: Mitsutoshi Narukawa
- Applicant: Mitsutoshi Narukawa
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Materials Corporation
- Current Assignee: Mitsubishi Materials Corporation
- Current Assignee Address: JP Tokyo
- Agency: Edwards Wildman Palmer LLP
- Priority: JP2011-143123 20110628
- Main IPC: C01B33/00
- IPC: C01B33/00 ; C01B33/08 ; C01B33/04 ; C01B33/02

Abstract:
This method for manufacturing trichlorosilane, includes: reacting metallurgical grade silicon with silicon tetrachloride and hydrogen so as to obtain a reaction gas; condensing the reaction gas so as to obtain a condensate; and distilling the condensate using a distillation system including a first distillation column and a secondary distillation column so as to refine trichlorosilane. While maintaining the condensate in a high temperature state so that a concentration of aluminum chloride in the condensate becomes in a range of a saturation solubility or less, the condensate flows to the first distillation column. A liquid distilled in the first distillation column is distilled by the secondary distillation column so as to refine trichlorosilane. A liquid in which aluminum chloride is concentrated is extracted from a bottom portion of the first distillation column. The extracted liquid is concentrated and dried, and then aluminum chloride is exhausted.
Public/Granted literature
- US20130004404A1 METHOD FOR MANUFACTURING TRICHLOROSILANE Public/Granted day:2013-01-03
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