Invention Grant
- Patent Title: Method and system for design of a reticle to be manufactured using variable shaped beam lithography
- Patent Title (中): 使用可变形光束光刻制造的光罩的设计方法和系统
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Application No.: US13970465Application Date: 2013-08-19
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Publication No.: US08828628B2Publication Date: 2014-09-09
- Inventor: Akira Fujimura
- Applicant: D2S, Inc.
- Applicant Address: US CA San Jose
- Assignee: D2S, Inc.
- Current Assignee: D2S, Inc.
- Current Assignee Address: US CA San Jose
- Agency: The Mueller Law Office, P.C.
- Main IPC: G03F1/20
- IPC: G03F1/20 ; G03F1/36 ; G03F7/20 ; B82Y40/00 ; B82Y10/00 ; H01J37/317 ; G03F1/00 ; G03F1/78
Abstract:
A method for optical proximity correction (OPC) is disclosed, in which a set of VSB shots is determined, where the set of shots can approximately form a target reticle pattern that is an OPC-compensated version of an input pattern. The set of shots is simulated to create a simulated reticle pattern. A substrate image is calculated, based on using the simulated reticle pattern in an optical lithographic process to form the substrate image. A system for OPC is also disclosed.
Public/Granted literature
- US20130337372A1 Method and System for Design of a Reticle to be Manufactured Using Variable Shaped Beam Lithography Public/Granted day:2013-12-19
Information query
