Invention Grant
- Patent Title: Positive-type photosensitive resin composition and cured film manufactured therefrom
- Patent Title (中): 正型感光性树脂组合物及其制造的固化膜
-
Application No.: US11491156Application Date: 2006-07-24
-
Publication No.: US08828651B2Publication Date: 2014-09-09
- Inventor: Tadashi Hatanaka
- Applicant: Tadashi Hatanaka
- Applicant Address: JP Tokyo
- Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2005-214589 20050725; JP2005-364886 20051219; JP2006-010383 20060118; JP2006-146893 20060526
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/027 ; G03F7/26 ; G03F7/16 ; G03F7/20

Abstract:
A positive-type photosensitive resin composition comprising component (A): an alkali-soluble resin having a functional group which undergoes heat crosslinking reaction with a compound of component (B), a functional group for film curing which undergoes thermoset reaction with a compound of component (C), and a number average molecular weight of 2,000 to 30,000; component (B): a compound having two or more vinyl ether groups per molecule; component (C): a compound having two or more blocked isocyanate groups per molecule; component (D): a photoacid generator; and component (E): a solvent. A production process of the positive-type photosensitive resin composition comprising mixing the above-mentioned components and maintaining the mixture at a temperature higher than room temperature. A cured film manufactured by using the positive-type photosensitive resin composition. The composition has a high sensitivity and little film reduction of unexposed part, maintains a high transmittance even after baking at a high temperature or resist stripping treatment, and cause no reduction of film thickness. Therefore, the composition provides a cured film suited as a film material for several displays.
Public/Granted literature
- US20070020559A1 Positive-type photosensitive resin composition and cured film manufactured therefrom Public/Granted day:2007-01-25
Information query
IPC分类: