Invention Grant
- Patent Title: Light-emitting device and method for manufacturing the same
- Patent Title (中): 发光装置及其制造方法
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Application No.: US13209827Application Date: 2011-08-15
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Publication No.: US08828757B2Publication Date: 2014-09-09
- Inventor: Chih-Yuan Lin , Shih-Yi Lien , Cheng-Hsing Chiang , Chih-Hung Pan
- Applicant: Chih-Yuan Lin , Shih-Yi Lien , Cheng-Hsing Chiang , Chih-Hung Pan
- Applicant Address: TW Hsinchu
- Assignee: Epistar Corporation
- Current Assignee: Epistar Corporation
- Current Assignee Address: TW Hsinchu
- Agency: Ditthavong & Steiner, P.C.
- Main IPC: H01L33/30
- IPC: H01L33/30 ; H01L21/20 ; H01L21/329
Abstract:
A light-emitting device and method for manufacturing the same are described. A method for manufacturing a light-emitting device comprising steps of: providing a growth substrate, wherein the growth substrate has a first surface and a second surface; forming a light-absorbable layer on the first surface of the growth substrate; forming an illuminant epitaxial structure on the light absorbable layer; providing a laser beam and irradiating the second surface of the growth substrate, wherein the laser beam wavelength is greater than 1000 nm; and removing the growth substrate.
Public/Granted literature
- US20130045551A1 LIGHT-EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2013-02-21
Information query
IPC分类:
