Invention Grant
- Patent Title: Thin film transistor manufacturing method
- Patent Title (中): 薄膜晶体管制造方法
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Application No.: US14071284Application Date: 2013-11-04
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Publication No.: US08829523B2Publication Date: 2014-09-09
- Inventor: Shijian Qin , Chengming He
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen
- Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Current Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Shenzhen
- Agency: Diederiks & Whitelaw, PLC
- Priority: CN201110197080 20110714
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L31/20 ; H01L31/036 ; H01L31/0376 ; H01L29/786 ; H01L29/66

Abstract:
The present invention provides a thin film transistor (TFT) manufacturing method and a TFT, a source electrode or drain electrode of the TFT is electrically connected to a data line directly during a forming process by providing a through hole in a surface above the data line of the TFT, so as to save the process cost. Further, the source electrode and drain electrode of the TFT are also manufactured with poly-silicon rather than metal material used in prior art, processing steps are simplified, thereby further saving the process cost.
Public/Granted literature
- US20140057400A1 Thin Film Transistor Manufacturing Method Public/Granted day:2014-02-27
Information query
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