Invention Grant
- Patent Title: Crystal producing apparatus, crystal producing method, substrate producing method, gallium nitride crystal, and gallium nitride substrate
- Patent Title (中): 晶体制造装置,晶体制造方法,衬底制造方法,氮化镓晶体和氮化镓衬底
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Application No.: US13678880Application Date: 2012-11-16
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Publication No.: US08829530B2Publication Date: 2014-09-09
- Inventor: Seiji Sarayama , Hirokazu Iwata
- Applicant: Seiji Sarayama , Hirokazu Iwata
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Cooper & Dunham LLP
- Priority: JP2006-270363 20061002; JP2007-198607 20070731
- Main IPC: H01L29/15
- IPC: H01L29/15 ; H01L31/0256 ; C30B9/12 ; C30B23/02 ; C30B25/18 ; C30B9/00 ; C30B29/40 ; C30B17/00 ; H01L29/20 ; H01L21/20 ; C30B25/20

Abstract:
A crystal producing apparatus includes a crystal forming unit and a crystal growing unit. The crystal forming unit forms a first gallium nitride (GaN) crystal by supplying nitride gas into melt mixture containing metal sodium (Na) and metal gallium (Ga). The first GaN crystal is sliced and polished to form GaN wafers. The crystal growing unit grows a second GaN crystal on a substrate formed by using a GaN wafer, by the hydride vapor phase epitaxy method, thus producing a bulked GaN crystal.
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