Invention Grant
- Patent Title: Vacuum system for immersion photolithography
- Patent Title (中): 浸没式光刻真空系统
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Application No.: US13187166Application Date: 2011-07-20
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Publication No.: US08830440B2Publication Date: 2014-09-09
- Inventor: Andrew John Harpham , Paul John Shechter , Paul Alan Stockman
- Applicant: Andrew John Harpham , Paul John Shechter , Paul Alan Stockman
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42 ; G03F7/20

Abstract:
A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
Public/Granted literature
- US20110273681A1 VACUUM SYSTEM FOR IMMERSION PHOTOLITHOGRAPHY Public/Granted day:2011-11-10
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