Invention Grant
- Patent Title: Fluid handling structure, a lithographic apparatus and a device manufacturing method
- Patent Title (中): 流体处理结构，光刻设备和装置制造方法
-
Application No.: US13404746Application Date: 2012-02-24
-
Publication No.: US08830441B2Publication Date: 2014-09-09
- Inventor: Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
- Applicant: Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42 ; G03F7/20
Abstract:
A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure, wherein the fluid handling structure has a main body with an undersurface, a moveable member moveable relative to the main body, and a self-regulating mechanism to maintain a gap of a certain size between a bottom surface of the moveable member and the facing surface independent of the size of a gap between the undersurface and the facing surface.
Public/Granted literature
- US20120249982A1 FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD Public/Granted day:2012-10-04
Information query
