Invention Grant
- Patent Title: Servo control system, lithographic apparatus and control method
- Patent Title (中): 伺服控制系统,光刻设备及控制方法
-
Application No.: US12247411Application Date: 2008-10-08
-
Publication No.: US08830442B2Publication Date: 2014-09-09
- Inventor: Youssef Karel Maria De Vos , Dirk-Jan Bijvoet , Ronald Casper Kunst , Ramidin Izair Kamidi , Khalid Manssouri
- Applicant: Youssef Karel Maria De Vos , Dirk-Jan Bijvoet , Ronald Casper Kunst , Ramidin Izair Kamidi , Khalid Manssouri
- Applicant Address: NL Veldhoven
- Assignee: AMSL Netherlands B.V.
- Current Assignee: AMSL Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/58 ; G03B27/62 ; G03B27/32

Abstract:
A servo control system to control a position of an object supported by a movable support includes a first measurement system to measure a position of the movable support, a comparative device to provide an error signal based on the comparison between a measured movable support position and a desired movable support position, a controller unit to provide a control signal based on the error signal, and an actuator configured to actuate the movable support based on the control signal. The servo control system further includes a slip compensation device to compensate a slip between the object and the movable support, the slip compensation device including a second measurement system to measure an object position with respect to the movable support, and an addition device to add a slip compensation signal to the measured movable support position or the error signal based on the measured object position.
Public/Granted literature
- US20090147236A1 Servo Control System, Lithographic Apparatus and Control Method Public/Granted day:2009-06-11
Information query