Invention Grant
- Patent Title: Inspection method and apparatus
- Patent Title (中): 检验方法和装置
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Application No.: US12805808Application Date: 2010-08-19
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Publication No.: US08830455B2Publication Date: 2014-09-09
- Inventor: Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Sander Frederik Wuister , Luigi Scaccabarozzi
- Applicant: Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Sander Frederik Wuister , Luigi Scaccabarozzi
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
In an aspect, an inspection method for detecting the presence or absence of a defect on an object, the object comprising a recess having a physical depth, is disclosed. The method includes directing radiation at the object, the radiation having a wavelength that is substantially equal to twice an optical depth of the recess, detecting radiation that is re-directed by the object or a defect on the object, and determining the presence or absence of a defect from the re-directed radiation.
Public/Granted literature
- US20110043795A1 Inspection method and apparatus Public/Granted day:2011-02-24
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