Invention Grant
- Patent Title: X-ray source with selective beam repositioning
- Patent Title (中): 具有选择性束重新定位的X射线源
-
Application No.: US13066679Application Date: 2011-04-21
-
Publication No.: US08831179B2Publication Date: 2014-09-09
- Inventor: David L. Adler , Wenbing Yun , Thomas Anthony Case
- Applicant: David L. Adler , Wenbing Yun , Thomas Anthony Case
- Applicant Address: US CA Pleasanton
- Assignee: Carl Zeiss X-Ray Microscopy, Inc.
- Current Assignee: Carl Zeiss X-Ray Microscopy, Inc.
- Current Assignee Address: US CA Pleasanton
- Agency: Houston & Associates LLP
- Main IPC: H01J35/02
- IPC: H01J35/02 ; H01J35/08 ; H01J35/14

Abstract:
During operation of an x-ray source, an electron source emits a beam of electrons. Moreover, a repositioning mechanism selectively repositions the beam of electrons on a surface of a target based on a feedback parameter, where a location of the beam of electrons on the surface of the target defines a spot size of x-rays output by the x-ray source. In response to receiving the beam of electrons, the target provides a transmission source of the x-rays. Furthermore, a beam-parameter detector provides the feedback parameter based on a physical characteristic associated with the beam of electrons and/or the x-rays output by the x-ray source. This physical characteristic may include: at least a portion of an optical spectrum emitted by the target, secondary electrons emitted by the target based on a cross-sectional shape of the beam of electrons; an intensity of the x-rays output by the target; and/or a current from the target.
Public/Granted literature
- US20120269324A1 X-ray source with selective beam repositioning Public/Granted day:2012-10-25
Information query