Invention Grant
US08831745B2 High-density array of micro-machined electrodes for neural stimulation 有权
用于神经刺激的高密度微加工电极阵列

High-density array of micro-machined electrodes for neural stimulation
Abstract:
The present invention is a micro-machined electrode for neural-electronic interfaces which can achieve a ten times lower impedance and higher charge injection limit for a given material and planar area.
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