Invention Grant
US08832607B2 Method for making correction map of dose amount, exposure method, and method for manufacturing semiconductor device 有权
制造剂量的校正​​图,曝光方法和制造半导体器件的方法的方法

Method for making correction map of dose amount, exposure method, and method for manufacturing semiconductor device
Abstract:
According to one embodiment, a method for making a correction map of a dose amount of EUV light used when exposing with the EUV light, includes estimating an exposure result based on an initial correction map of the dose amount and flare of the EUV light, determining a goodness of the exposure result, and correcting the initial correction map in the case where the exposure result is unacceptable. And, the correcting of the initial correction map, the estimating of the exposure result, and the determining of the goodness are repeated until the exposure result is good.
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