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US08835091B2 Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition 有权
微结构和光学图案化的牺牲成膜组合物的制造方法

Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition
Abstract:
A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) coating a substrate with a composition comprising a cresol novolac resin, a crosslinker, and a photoacid generator, (B) heating to form a sacrificial film, (C) patternwise exposure, (D) development to form a sacrificial film pattern, and (E) forming crosslinks within the cresol novolac resin.
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