Invention Grant
- Patent Title: Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition
- Patent Title (中): 微结构和光学图案化的牺牲成膜组合物的制造方法
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Application No.: US13474795Application Date: 2012-05-18
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Publication No.: US08835091B2Publication Date: 2014-09-16
- Inventor: Yoshinori Hirano , Hideyoshi Yanagisawa
- Applicant: Yoshinori Hirano , Hideyoshi Yanagisawa
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2011-113676 20110520
- Main IPC: G03F7/023
- IPC: G03F7/023 ; G03F7/38 ; G03F7/40 ; B81C1/00

Abstract:
A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) coating a substrate with a composition comprising a cresol novolac resin, a crosslinker, and a photoacid generator, (B) heating to form a sacrificial film, (C) patternwise exposure, (D) development to form a sacrificial film pattern, and (E) forming crosslinks within the cresol novolac resin.
Public/Granted literature
- US20120292286A1 METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE SACRIFICIAL FILM-FORMING COMPOSITION Public/Granted day:2012-11-22
Information query
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