Invention Grant
US08835097B2 Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process
有权
使用所述聚合物的锍盐，聚合物，化学放大抗蚀剂组合物和抗蚀剂图案化工艺
- Patent Title: Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process
- Patent Title (中): 使用所述聚合物的锍盐，聚合物，化学放大抗蚀剂组合物和抗蚀剂图案化工艺
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Application No.: US13476629Application Date: 2012-05-21
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Publication No.: US08835097B2Publication Date: 2014-09-16
- Inventor: Daisuke Domon , Keiichi Masunaga , Satoshi Watanabe
- Applicant: Daisuke Domon , Keiichi Masunaga , Satoshi Watanabe
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff, PLC
- Priority: JP2011-120454 20110530
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07C309/12 ; C07C309/19 ; C07C309/22 ; C08F20/28 ; G03F7/039 ; C08F220/38
Abstract:
There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate acid strength and not impairing adhesion with a substrate into a base polymer; a polymer using the said sulfonium salt; a chemically amplified resist composition using the said polymer as a base polymer; and a patterning process using the said chemically amplified resist composition.
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