Invention Grant
US08835293B2 Methods for forming conductive elements and vias on substrates 有权
在基板上形成导电元件和通孔的方法

Methods for forming conductive elements and vias on substrates
Abstract:
Methods of forming conductive elements on and in a substrate include forming a layer of conductive material over a surface of a substrate prior to forming a plurality of vias through the substrate from an opposing surface of the substrate to the layer of conductive material. In some embodiments, a temporary carrier may be secured to the layer of conductive material on a side thereof opposite the substrate prior to forming the vias. Structures, including workpieces formed using such methods, are also disclosed.
Public/Granted literature
Information query
Patent Agency Ranking
0/0