Invention Grant
- Patent Title: NiSi rework procedure to remove platinum residuals
- Patent Title (中): NiSi返修程序去除铂残留物
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Application No.: US13415492Application Date: 2012-03-08
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Publication No.: US08835298B2Publication Date: 2014-09-16
- Inventor: Sivakumar Kumarasamy , Clemens Fitz , Markus Lenski , Jochen Poth , Kristin Schupke
- Applicant: Sivakumar Kumarasamy , Clemens Fitz , Markus Lenski , Jochen Poth , Kristin Schupke
- Applicant Address: KY Grand Cayman
- Assignee: GlobalFoundries Inc.
- Current Assignee: GlobalFoundries Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Ditthavong & Steiner, P.C.
- Main IPC: H01L21/3205
- IPC: H01L21/3205 ; H01L21/4763
Abstract:
The amount of Pt residues remaining after forming Pt-containing NiSi is reduced by performing a rework including applying SPM at a temperature of 130° C. in a SWC tool, if Pt residue is detected. Embodiments include depositing a layer of Ni/Pt on a semiconductor substrate, annealing the deposited Ni/Pt layer, removing unreacted Ni from the annealed Ni/Pt layer, annealing the Ni removed Ni/Pt layer, removing unreacted Pt from the annealed Ni removed Ni/Pt layer, analyzing the Pt removed Ni/Pt layer for unreacted Pt residue, and if unreacted Pt residue is detected, applying SPM to the Pt removed Ni/Pt layer in a SWC tool. The SPM may be applied to the Pt removed Ni′/Pt layer at a temperature of 130° C.
Public/Granted literature
- US20130234213A1 NISI REWORK PROCEDURE TO REMOVE PLATINUM RESIDUALS Public/Granted day:2013-09-12
Information query
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