Invention Grant
US08835524B2 Resin precursor composition and resin obtained by photocuring the same
有权
树脂前体组合物和通过其光固化获得的树脂
- Patent Title: Resin precursor composition and resin obtained by photocuring the same
- Patent Title (中): 树脂前体组合物和通过其光固化获得的树脂
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Application No.: US13384763Application Date: 2010-07-20
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Publication No.: US08835524B2Publication Date: 2014-09-16
- Inventor: Akiko Miyakawa
- Applicant: Akiko Miyakawa
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JPP2009-171444 20090722
- International Application: PCT/JP2010/062167 WO 20100720
- International Announcement: WO2011/010633 WO 20110127
- Main IPC: B41J2/16
- IPC: B41J2/16 ; B29D11/00 ; C08F2/46 ; C08G61/04

Abstract:
Disclosed is a resin precursor composition including a bifunctional (meth)acrylate containing a fluorine atom, a bifunctional (meth)acrylate having a fluorene structure, and a photopolymerization initiator, the resin precursor composition in which the formation of precipitates during its storage is suppressed; and a resin obtained from the same.Specifically disclosed is a resin precursor composition that contains a bifunctional fluorine-containing (meth)acrylate (component A); a (meth)acrylate having a fluorene structure (component B); and a photopolymerization initiator (component C), wherein the component B includes a bifunctional (meth)acrylate having a fluorene structure (b-1) and a monofunctional (meth)acrylate having a fluorene structure (b-2) at a molar ratio (b-1):(b-2) of 90:10 to 70:30.
Public/Granted literature
- US20120309863A1 RESIN PRECURSOR COMPOSITION AND RESIN OBTAINED BY PHOTOCURING THE SAME Public/Granted day:2012-12-06
Information query
IPC分类: