Invention Grant
- Patent Title: Enhanced lift-off techniques for use with dielectric optical coatings and light sensors produced therefrom
- Patent Title (中): 用于介质光学涂层和由其生产的光传感器的增强剥离技术
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Application No.: US13530809Application Date: 2012-06-22
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Publication No.: US08836064B2Publication Date: 2014-09-16
- Inventor: Eric S. Lee , Michael I-Shan Sun , Francois Hebert
- Applicant: Eric S. Lee , Michael I-Shan Sun , Francois Hebert
- Applicant Address: US CA Milpitas
- Assignee: Intersil Americas LLC
- Current Assignee: Intersil Americas LLC
- Current Assignee Address: US CA Milpitas
- Agency: Vierra Magen Marcus LLP
- Main IPC: H01L31/0232
- IPC: H01L31/0232

Abstract:
Light sensors including dielectric optical coatings to shape their spectral responses, and methods for fabricating such light sensors in a manner that accelerates lift-off processes and increases process margins, are described herein. In certain embodiments, a short duration soft bake is performed. Alternatively, or additionally, temperature cycling is performed. Alternatively, or additionally, photolithography is performed using a photomask that includes one or more dummy corners, dummy islands and/or dummy rings. Each of the aforementioned embodiments form and/or increase a number of micro-cracks in the dielectric optical coating not covering the photodetector sensor region, thereby enabling an accelerated lift-off process and an increased process margin. Alternatively, or additionally, a portion of the photomask can include chamfered corners so that the dielectric optical coating includes chamfered corners, which improves the thermal reliability of the dielectric optical coating.
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