Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US13989962Application Date: 2010-11-29
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Publication No.: US08836150B2Publication Date: 2014-09-16
- Inventor: Hiroaki Tanaka
- Applicant: Hiroaki Tanaka
- Applicant Address: JP Toyota-Shi
- Assignee: Toyota Jidosha Kabushiki Kaisha
- Current Assignee: Toyota Jidosha Kabushiki Kaisha
- Current Assignee Address: JP Toyota-Shi
- Agency: Kenyon & Kenyon LLP
- International Application: PCT/JP2010/071240 WO 20101129
- International Announcement: WO2012/073302 WO 20120607
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L23/00 ; H01L29/739 ; H01L29/417

Abstract:
A semiconductor device disclosed in this description has a semiconductor substrate including an element region in which a semiconductor element is formed, and an upper surface electrode formed on an upper surface of the element region of the semiconductor substrate. The upper surface electrode has a first thickness region and a second thickness region which is thicker than the first thickness region, and a bonding wire is bonded on the second thickness region.
Public/Granted literature
- US20130241084A1 SEMICONDUCTOR DEVICE Public/Granted day:2013-09-19
Information query
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