Invention Grant
- Patent Title: Color filter and manufacturing method thereof
- Patent Title (中): 滤色器及其制造方法
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Application No.: US12892076Application Date: 2010-09-28
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Publication No.: US08837063B2Publication Date: 2014-09-16
- Inventor: Shao-Min Hung , Han-Kang Liu , Bo-Nan Chen
- Applicant: Shao-Min Hung , Han-Kang Liu , Bo-Nan Chen
- Applicant Address: TW Tainan
- Assignee: Himax Semiconductor, Inc.
- Current Assignee: Himax Semiconductor, Inc.
- Current Assignee Address: TW Tainan
- Agency: J.C. Patents
- Main IPC: G02B5/20
- IPC: G02B5/20 ; G02F1/1335

Abstract:
A method for manufacturing a color filter is provided. The method includes following steps. A substrate is provided. A first filter layer is formed on a first part of a first region and a first part of a second region of the substrate. A second filter layer is formed on a second part of the second region. A third filter layer is formed on a second part of the first region and a third part of the second region. When a white beam is projected on the color filter, the first region and the second region reflect a plurality of color beams. A color filter manufactured through the method is also provided.
Public/Granted literature
- US20120075736A1 COLOR FILTER AND MANUFACTURING METHOD THEREOF Public/Granted day:2012-03-29
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