Invention Grant
US08839740B2 Simple chemical vapor deposition systems for depositing multiple-metal aluminide coatings
有权
用于沉积多金属铝化物涂层的简单化学气相沉积系统
- Patent Title: Simple chemical vapor deposition systems for depositing multiple-metal aluminide coatings
- Patent Title (中): 用于沉积多金属铝化物涂层的简单化学气相沉积系统
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Application No.: US12142539Application Date: 2008-06-19
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Publication No.: US08839740B2Publication Date: 2014-09-23
- Inventor: David C. Fairbourn
- Applicant: David C. Fairbourn
- Applicant Address: US OH Cincinnati
- Assignee: MT Coatings, LLC
- Current Assignee: MT Coatings, LLC
- Current Assignee Address: US OH Cincinnati
- Agency: Wood, Herron & Evans LLP
- Main IPC: C23C16/448
- IPC: C23C16/448 ; C23C16/02 ; C23C16/08 ; C23C28/00

Abstract:
A chemical vapor deposition (CVD) system and method for applying an aluminide coating constituted by two or more extrinsic metal components on a jet engine component. The aluminide coating is capable of forming a protective complex oxide upon subsequent heating in an oxidizing environment. At least one of the extrinsic metals in the aluminide coating is provided as a first vapor phase reactant from a receptacle coupled by a closed communication path with the reaction chamber of the CVD system and free of a carrier gas. The aluminide coating is formed by the chemical combination of the first vapor phase reactant with a second vapor phase reactant either created in situ in the reaction chamber or supplied by a carrier gas to the reaction chamber from a precursor source.
Public/Granted literature
- US20080245302A1 SIMPLE CHEMICAL VAPOR DEPOSITION SYSTEMS FOR DEPOSITING MULTIPLE-METAL ALUMINIDE COATINGS Public/Granted day:2008-10-09
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