Invention Grant
- Patent Title: Method for manufacturing a polycrystalline silicon thin film by joule-heating induced crystallization
- Patent Title (中): 通过焦耳加热诱导结晶制造多晶硅薄膜的方法
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Application No.: US12962990Application Date: 2010-12-08
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Publication No.: US08840720B2Publication Date: 2014-09-23
- Inventor: Cheol-Su Kim
- Applicant: Cheol-Su Kim
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2010-0054406 20100609
- Main IPC: C30B1/02
- IPC: C30B1/02 ; C30B29/06 ; C23C16/56 ; H01L21/02 ; C23C16/24

Abstract:
An apparatus for manufacturing a polycrystalline silicon thin film, including a crystallization container filled with silicon oil, crystallization electrodes spaced apart from the crystallization container, and a conductive plate positioned between the crystallization electrodes and connected with the crystallization electrodes. Because an insulating layer between the amorphous silicon thin film and the conductive plate is formed by using silicon oil filled within the crystallization container, Joule-heating induced crystallization (JIC) can be performed through a simpler manufacturing process.
Public/Granted literature
- US20110306183A1 APPARATUS AND METHOD FOR MANUFACTURING POLYCRYSTALLINE SILICON THIN FILM Public/Granted day:2011-12-15
Information query
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