Invention Grant
- Patent Title: Continuous growth of single-wall carbon nanotubes using chemical vapor deposition
- Patent Title (中): 使用化学气相沉积法连续生长单壁碳纳米管
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Application No.: US12236144Application Date: 2008-09-23
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Publication No.: US08840724B2Publication Date: 2014-09-23
- Inventor: Leonid Grigorian , Louis Hornyak , Anne C. Dillon , Michael J. Heben
- Applicant: Leonid Grigorian , Louis Hornyak , Anne C. Dillon , Michael J. Heben
- Applicant Address: JP Tokyo
- Assignee: Honda Motor Co., Ltd.
- Current Assignee: Honda Motor Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Fenwick & West LLP
- Agent Mark Duell
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C30B29/60 ; B82Y30/00 ; C23C16/455 ; C30B35/00 ; C30B25/18

Abstract:
The invention relates to a chemical vapor deposition process for the continuous growth of a carbon single-wall nanotube where a carbon-containing gas composition is contacted with a porous membrane and decomposed in the presence of a catalyst to grow single-wall carbon nanotube material. A pressure differential exists across the porous membrane such that the pressure on one side of the membrane is less than that on the other side of the membrane. The single-wall carbon nanotube growth may occur predominately on the low-pressure side of the membrane or, in a different embodiment of the invention, may occur predominately in between the catalyst and the membrane. The invention also relates to an apparatus used with the carbon vapor deposition process.
Public/Granted literature
- US20090013931A1 Continuous Growth Of Single-Wall Carbon Nanotubes Using Chemical Vapor Deposition Public/Granted day:2009-01-15
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