Invention Grant
- Patent Title: Plasma generating apparatus
- Patent Title (中): 等离子体发生装置
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Application No.: US12562880Application Date: 2009-09-18
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Publication No.: US08840844B2Publication Date: 2014-09-23
- Inventor: Hideki Fujita , Kibatsu Shinohara
- Applicant: Hideki Fujita , Kibatsu Shinohara
- Applicant Address: JP Kyoto
- Assignee: Nissin Ion Equipment Co., Ltd.
- Current Assignee: Nissin Ion Equipment Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Osha Liang LLP
- Priority: JP2008-297518 20081121
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01J37/317 ; H01J37/02

Abstract:
The plasma generating apparatus includes: an antenna chamber which is disposed adjacently to a plasma chamber that produces a plasma, and which is exhausted to vacuum; an antenna which is disposed in the antenna chamber, and which radiates a high-frequency wave; a partition plate which is made of an insulator, which separates the plasma chamber from the antenna chamber to block a gas from entering the antenna chamber, and which allows the high-frequency wave radiated from the antenna to pass through the partition plate; and a magnet device which is disposed outside the plasma chamber, and which generates a magnetic field for causing electron cyclotron resonance in the plasma chamber.
Public/Granted literature
- US20100129272A1 PLASMA GENERATING APPARATUS Public/Granted day:2010-05-27
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