Invention Grant
- Patent Title: Flow channel structure and method of manufacturing same
- Patent Title (中): 流道结构及其制造方法
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Application No.: US13131893Application Date: 2009-12-22
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Publication No.: US08840850B2Publication Date: 2014-09-23
- Inventor: Masaya Nakatani , Makoto Takahashi , Hiroshi Ushio , Takeki Yamamoto
- Applicant: Masaya Nakatani , Makoto Takahashi , Hiroshi Ushio , Takeki Yamamoto
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2009-006484 20090115; JP2009-067412 20090319
- International Application: PCT/JP2009/007119 WO 20091222
- International Announcement: WO2010/082279 WO 20100722
- Main IPC: F16L55/00
- IPC: F16L55/00 ; B05D3/00 ; B32B38/10 ; B01F13/00 ; B81C1/00 ; B01L3/00 ; G01N27/447 ; B81B3/00 ; G01N1/38 ; B01F5/06
Abstract:
A flow channel structure includes a substrate having a flow channel formed therein, and plural fibrous bristles extending from the inner wall of the flow channel. The flow channel is configured to allow a solution to flow through the flow channel. The inner wall of the flow channel is made of silicon. The flow channel is configured to allow a solution to flow through the flow channel. This flow channel structure can homogenize the solution inside the flow channel.
Public/Granted literature
- US20110232794A1 FLOW CHANNEL STRUCTURE AND METHOD OF MANUFACTURING SAME Public/Granted day:2011-09-29
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