Invention Grant
US08841060B2 Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device
有权
光敏感或辐射敏感性树脂组合物，抗蚀剂膜和图案形成方法各自使用组合物，电子器件的制备方法和电子器件
- Patent Title: Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device
- Patent Title (中): 光敏感或辐射敏感性树脂组合物，抗蚀剂膜和图案形成方法各自使用组合物，电子器件的制备方法和电子器件
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Application No.: US13537843Application Date: 2012-06-29
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Publication No.: US08841060B2Publication Date: 2014-09-23
- Inventor: Shohei Kataoka , Yusuke Iizuka , Akinori Shibuya , Tomoki Matsuda , Naohiro Tango
- Applicant: Shohei Kataoka , Yusuke Iizuka , Akinori Shibuya , Tomoki Matsuda , Naohiro Tango
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-146859 20110630
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20 ; G03F7/11 ; G03F7/039
Abstract:
An actinic-ray-sensitive or radiation-sensitive resin composition which is capable of improving line edge roughness (LER) and inhibiting pattern collapse, a resist film and a pattern forming method each using the same, a method for preparing an electronic device, and an electronic device are provided.The actinic-ray-sensitive or radiation-sensitive resin composition contains: (A) a resin having repeating units having a structure represented by any one of the following general formulae (I-1) to (I-3), and repeating units containing at least one selected from the group consisting of a lactone structure, a sultone structure, and a cyano group; and (B) a compound that generates an acid by irradiation with actinic rays or radiations.
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