Invention Grant
- Patent Title: Manufacturing method of exposure apparatus and device manufacturing method
- Patent Title (中): 曝光装置及装置制造方法的制造方法
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Application No.: US13022922Application Date: 2011-02-08
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Publication No.: US08841065B2Publication Date: 2014-09-23
- Inventor: Go Ichinose
- Applicant: Go Ichinose
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A manufacturing method of an exposure apparatus includes adjusting a positioning device that determines a positional relation at the time of docking between a body and a stage module such that a positional relation between an absolute reference surface of a metrology frame of the body and a stage position reference surface of the stage module becomes a desired relation. Accordingly, after that, only by docking the body and the stage module with each other via the positioning device, the positional relation between the absolute reference surface of the body and the stage position reference surface of the stage module becomes a desired relation.
Public/Granted literature
- US20110200944A1 MANUFACTURING METHOD OF EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2011-08-18
Information query
IPC分类:
