Invention Grant
- Patent Title: Polyamide resins and processes for molding them
- Patent Title (中): 聚酰胺树脂及其成型方法
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Application No.: US13824695Application Date: 2011-11-08
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Publication No.: US08841407B2Publication Date: 2014-09-23
- Inventor: Hatsuki Oguro , Jun Mitadera , Hisayuki Kuwahara
- Applicant: Hatsuki Oguro , Jun Mitadera , Hisayuki Kuwahara
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-264058 20101126
- International Application: PCT/JP2011/075658 WO 20111108
- International Announcement: WO2012/070377 WO 20120531
- Main IPC: C08G69/28
- IPC: C08G69/28 ; C08G69/26 ; C08L77/06

Abstract:
Provided is a polyamide resin having high heat resistance, excellent moldability and excellent mechanical properties. The polyamide resin comprises a diamine unit containing 70 mol % or more of a xylylenediamine unit and a dicarboxylic acid unit containing 70 mol % or more of a straight chain aliphatic dicarboxylic acid unit, wherein the xylylenediamine unit is composed of 50 to 95 mol % of p-xylylenediamine and 50 to 5 mol % of m-xylylenediamine; the straight chain aliphatic dicarboxylic acid unit is composed of 50 to 100 mol % of adipic acid and 0 to less than 50 mol % of sebacic acid or other straight chain aliphatic dicarboxylic acids; the molar ratio of reacted diamine units to reacted dicarboxylic acid units (the number of moles of reacted diamine units/the number of moles of reacted dicarboxylic acid units) is less than 0.994; and the polyamide resin has a number average molecular weight of 10,000 to 25,000 and a melting point of 285° C. or more.
Public/Granted literature
- US20130184431A1 POLYAMIDE RESINS AND PROCESSES FOR MOLDING THEM Public/Granted day:2013-07-18
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