Invention Grant
- Patent Title: Imprint lithography apparatus
- Patent Title (中): 压印光刻设备
-
Application No.: US12781225Application Date: 2010-05-17
-
Publication No.: US08845320B2Publication Date: 2014-09-30
- Inventor: Catharinus De Schiffart , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen
- Applicant: Catharinus De Schiffart , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: B29C59/02
- IPC: B29C59/02 ; G03F7/00 ; B82Y10/00 ; B82Y40/00 ; G03F9/00
Abstract:
An arrangement suitable for use in an imprint lithography apparatus is disclosed. The arrangement includes a support structure arranged to support an imprint template arrangement, a first actuator configured to apply a force to the imprint template arrangement, and a second actuator attached to the support structure, and arranged in use to extend between the support structure and the imprint template arrangement, the second actuator configured to apply a force to the imprint template arrangement, a range of movement of the second actuator being greater than a range of movement of the first actuator.
Public/Granted literature
- US20100297282A1 IMPRINT LITHOGRAPHY APPARATUS Public/Granted day:2010-11-25
Information query
