Invention Grant
US08846290B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
有权
光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
- Patent Title (中): 光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法
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Application No.: US13260777Application Date: 2010-03-26
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Publication No.: US08846290B2Publication Date: 2014-09-30
- Inventor: Naohiro Tango , Michihiro Shirakawa , Mitsuhiro Fujita , Shuhei Yamaguchi , Akinori Shibuya , Shohei Kataoka
- Applicant: Naohiro Tango , Michihiro Shirakawa , Mitsuhiro Fujita , Shuhei Yamaguchi , Akinori Shibuya , Shohei Kataoka
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2009-088557 20090331; JP2009-205362 20090904
- International Application: PCT/JP2010/056041 WO 20100326
- International Announcement: WO2010/114107 WO 20101007
- Main IPC: G03F7/027
- IPC: G03F7/027 ; C08F220/18
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.
Public/Granted literature
- US20120015302A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME Public/Granted day:2012-01-19
Information query
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