Invention Grant
US08847113B2 Laser processing systems and methods for beam dithering and skiving
有权
用于光束抖动和扫描的激光加工系统和方法
- Patent Title: Laser processing systems and methods for beam dithering and skiving
- Patent Title (中): 用于光束抖动和扫描的激光加工系统和方法
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Application No.: US13279993Application Date: 2011-10-24
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Publication No.: US08847113B2Publication Date: 2014-09-30
- Inventor: Mark A. Unrath , Andrew Berwick , Alexander A. Myachin
- Applicant: Mark A. Unrath , Andrew Berwick , Alexander A. Myachin
- Applicant Address: US OR Portland
- Assignee: Electro Scientific Industries, Inc.
- Current Assignee: Electro Scientific Industries, Inc.
- Current Assignee Address: US OR Portland
- Agency: Stoel Rives LLP
- Main IPC: B23K26/06
- IPC: B23K26/06 ; B23K26/00 ; B23K26/02 ; G06F19/00 ; G02B26/12 ; G02F1/03 ; B23K26/08 ; B23K26/36 ; B23K26/073 ; H01L21/48

Abstract:
A laser processing system includes a first positioning system for imparting first relative movement of a beam path along a beam trajectory with respect to a workpiece, a processor for determining a second relative movement of the beam path along a plurality of dither rows, a second positioning system for imparting the second relative movement, and a laser source for emitting laser beam pulses. The system may compensate for changes in processing velocity to maintain dither rows at a predetermined angle. For example, the dither rows may remain perpendicular to the beam trajectory regardless of processing velocity. The processing velocity may be adjusted to process for an integral number of dither rows to complete a trench. A number of dither points in each row may be selected based on a width of the trench. Fluence may be normalized by adjusting for changes to processing velocity and trench width.
Public/Granted literature
- US20120273472A1 LASER PROCESSING SYSTEMS AND METHODS FOR BEAM DITHERING AND SKIVING Public/Granted day:2012-11-01
Information query
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