Invention Grant
- Patent Title: Electro-optical device, method of manufacturing electro-optical device, and electronic apparatus
- Patent Title (中): 电光装置，电光装置的制造方法以及电子装置
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Application No.: US12974493Application Date: 2010-12-21
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Publication No.: US08848143B2Publication Date: 2014-09-30
- Inventor: Hiroaki Jiroku
- Applicant: Hiroaki Jiroku
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: ALG Intellectual Property, LLC
- Priority: JP2009-291946 20091224
- Main IPC: G02F1/1333
- IPC: G02F1/1333 ; G02F1/1335 ; G02F1/1362
Abstract:
An electro-optical device including: a reflection film which is formed at each of a plurality of pixels; a dielectric multi-layer film which is formed over the reflection film; a planarizing isolation film over the dielectric multi-layer film burying a step formed by a reflection film; and a first alignment film which is formed over the planarizing isolation film. The reflection film, the dielectric multi-layer film, the planarizing isolation film, and the first alignment film are formed on the surface facing the second substrate in the first substrate.
Public/Granted literature
- US20110157530A1 ELECTRO-OPTICAL DEVICE, METHOD OF MANUFACTURING ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS Public/Granted day:2011-06-30
Information query
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